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qcl:tutorials:thz_qcl_-_fathololoumi_2012 [2017/05/24 11:53] stefan.birner |
qcl:tutorials:thz_qcl_-_fathololoumi_2012 [2018/03/20 11:14] (current) thomas.grange [Device definition] |
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This ''*-FAST.xml'' file is only intended to show the user how to run a "quick" simulation. | This ''*-FAST.xml'' file is only intended to show the user how to run a "quick" simulation. | ||
The results shown here correspond to the ''*-MEDIUM.xml'' file. | The results shown here correspond to the ''*-MEDIUM.xml'' file. | ||
+ | ''[Fathololoumi2012]'' designed the laser to operate at an electric field of -12.2 kV/cm. | ||
- | ''[Fathololoumi2012]'' designed the laser to operate at an electric field of -12.2 kV/cm with a transition energy of 15.1 meV (or 11.5 meV?). | ||
===== Simulation details ===== | ===== Simulation details ===== | ||
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==== Device definition ==== | ==== Device definition ==== | ||
- | First, the well (GaAs) and barrier materials (AlGaAs) have to be defined. | + | First, the materials used in the structure (GaAs and AlGaAs) have to be defined. Each material is referred by an alias, which is here 'well' for GaAs and 'barrier' and AlGaAs. |
<code> | <code> | ||
- | <Material_Well> | + | <Materials> |
- | <name> GaAs </name> | + | |
- | </Material_Well> | + | |
- | <Material_Barrier> | + | <Material> |
- | <name> Al(x)Ga(1-x)As </name> | + | <Name>GaAs</Name> |
- | <Alloy_Composition> 0.15 </Alloy_Composition> <!-- x=0.15 (Al0.15Ga0.85As) --> | + | <Alias>well</Alias> |
- | </Material_Barrier> | + | <Effective_mass_from_kp_parameters>yes</Effective_mass_from_kp_parameters> |
+ | </Material> | ||
+ | |||
+ | <Material> | ||
+ | <Name>Al(x)Ga(1-x)As</Name> | ||
+ | <Alloy_Composition>0.15</Alloy_Composition> | ||
+ | <Alias>barrier</Alias> | ||
+ | <Effective_mass_from_kp_parameters>yes</Effective_mass_from_kp_parameters> | ||
+ | </Material> | ||
+ | |||
+ | <!-- Model nonparabolicity --> | ||
+ | <NonParabolicity>yes</NonParabolicity> | ||
+ | |||
+ | <UseConductionBandOffset>yes</UseConductionBandOffset> | ||
+ | |||
+ | </Materials> | ||
</code> | </code> | ||
+ | In addition, it is specified that the effective mass is calculated from the k.p parameters. Also, non | ||
+ | |||
Then, alternating layers consisting of barrier and well have to be specified, i.e. **4.1** / __16.0__ / **4.3** / 8.9 / **2.46** / 8.15, where AlGaAs is in bold fonts and the doping region is underlined, i.e. the wide GaAs quantum well is doped. | Then, alternating layers consisting of barrier and well have to be specified, i.e. **4.1** / __16.0__ / **4.3** / 8.9 / **2.46** / 8.15, where AlGaAs is in bold fonts and the doping region is underlined, i.e. the wide GaAs quantum well is doped. | ||
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</code> | </code> | ||
==== Material parameters ==== | ==== Material parameters ==== | ||
- | We set the conduction band offset between GaAs and Al<sub>0.15</sub>Ga<sub>0.85</sub>As to 0.120 eV, i.e. we overwrite the default material parameters that are contained in the [[qcl:material_database|material database]]. | + | We set the conduction band offset (CBO) between GaAs and Al<sub>0.15</sub>Ga<sub>0.85</sub>As to 0.120 eV, i.e. we overwrite the default material parameters that are contained in the [[qcl:material_database|material database]]. |
<code> | <code> | ||
<Material_Parameters> | <Material_Parameters> | ||
- | <Band_Offset unit="meV"> 120 </Band_Offset> | + | <Overwrite_ConductionBandOffset>true</Overwrite_ConductionBandOffset> |
+ | <ConductionBandOffset unit="meV"> 120 </ConductionBandOffset> | ||
</Material_Parameters> | </Material_Parameters> | ||
</code> | </code> | ||
+ | (In fact, the figures shown in the tutorial were generated using a different CBO of 0.149 eV.) | ||
==== Electric field ==== | ==== Electric field ==== | ||
The total length of one period is L = 43.91 nm. | The total length of one period is L = 43.91 nm. |